The heating principle of HP(heating plate) is electric resistance heating. It is a part of far infrared heating, of no visible light.
All of the electric power becomes thermal energy. Therefore, the electrothermal efficiency is more than 90%. The metal
Thin-film, formed by target material at thickness of 3000A ~5000A, when switched on, will release heat from all of the
Deposited area evenly. HP Heating Element can be designed in various power densities, in compliance with the surface
Temperature requirement. The power density may reach 20W/sq-cm, though common design of 5W/sq-cm is sufficient. In short
The characteristic of sputtering is as following:
1. Even heating
2. Large area heating
3. Low heating temperature under same surgace temperature
4. Far infrared radiant heating.
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